Translated title of the contribution | An X-Ray Diffraction Study of the Effect of Rapid Thermal Annealing on GaAs Layers on Si Substrates |
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Original language | English |
Pages (from-to) | 1-49 |
Number of pages | 49 |
Journal | Materials Letters |
Volume | 10 |
Publication status | Published - 1990 |
Publication type | A1 Journal article-refereed |
Publication forum classification
- No publication forum level