Backside detection of photoresist development endpoint using surface plasmon resonance

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    Translated title of the contributionBackside detection of photoresist development endpoint using surface plasmon resonance
    Original languageEnglish
    Title of host publicationASMC 2007. Proceedings of the 18th Annual IEEE/SMI Advanced Semiconductor Manufacturing Conference, 11-12 June 2007, Stresa, Italy
    Pages283-287
    DOIs
    Publication statusPublished - 2007
    Publication typeA4 Article in a conference publication

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