Bi incorporation and the role of surface droplets in GaAsBi epitaxy

Research output: Other conference contributionAbstractScientific

Original languageEnglish
Publication statusPublished - 16 Jul 2018
Publication typeNot Eligible
Event9th International Workshop on Bismuth-Containing Semiconductors - Kyoto, Japan
Duration: 15 Jul 201818 Jul 2018

Conference

Conference9th International Workshop on Bismuth-Containing Semiconductors
Country/TerritoryJapan
CityKyoto
Period15/07/1818/07/18

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