Comparison of induced stresses due to electroless versus sputtered copper interconnect technology

P.J. McNally; J. Kanatharana; B.H.W. Toh; D.W. McNeill; T. Tuomi; A.N. Danilewsky; L. Knuuttila; J. Riikonen; J. Toivonen

doi:10.1088/0268-1242/19/11/012

Comparison of induced stresses due to electroless versus sputtered copper interconnect technology

P.J. McNally, J. Kanatharana, B.H.W. Toh, D.W. McNeill, T. Tuomi, A.N. Danilewsky, L. Knuuttila, J. Riikonen, J. Toivonen

Research output: Contribution to journal › Article › Scientific › peer-review

1 Citation (Scopus)

Translated title of the contribution	Comparison of induced stresses due to electroless versus sputtered copper interconnect technology
Original language	English
Pages (from-to)	1280-1284
Journal	Semiconductor Science and Technology
Volume	19
Issue number	11
DOIs	https://doi.org/10.1088/0268-1242/19/11/012
Publication status	Published - 2004
Externally published	Yes
Publication type	A1 Journal article-refereed

Publication forum classification

Publication forum level 1

Access to Document

10.1088/0268-1242/19/11/012

Cite this

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title = "Comparison of induced stresses due to electroless versus sputtered copper interconnect technology",

author = "P.J. McNally and J. Kanatharana and B.H.W. Toh and D.W. McNeill and T. Tuomi and A.N. Danilewsky and L. Knuuttila and J. Riikonen and J. Toivonen",

note = "Contribution: organisation=fys,FACT1=1",

year = "2004",

doi = "10.1088/0268-1242/19/11/012",

language = "English",

volume = "19",

pages = "1280--1284",

journal = "Semiconductor Science and Technology",

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TY - JOUR

T1 - Comparison of induced stresses due to electroless versus sputtered copper interconnect technology

AU - McNally, P.J.

AU - Kanatharana, J.

AU - Toh, B.H.W.

AU - McNeill, D.W.

AU - Tuomi, T.

AU - Danilewsky, A.N.

AU - Knuuttila, L.

AU - Riikonen, J.

AU - Toivonen, J.

N1 - Contribution: organisation=fys,FACT1=1

PY - 2004

Y1 - 2004

U2 - 10.1088/0268-1242/19/11/012

DO - 10.1088/0268-1242/19/11/012

M3 - Article

SN - 0268-1242

VL - 19

SP - 1280

EP - 1284

JO - Semiconductor Science and Technology

JF - Semiconductor Science and Technology

IS - 11

ER -