Comparison of induced stresses due to electroless versus sputtered copper interconnect technology

P.J. McNally; J. Kanatharana; B.H.W. Toh; D.W. McNeill; T. Tuomi; A.N. Danilewsky; L. Knuuttila; J. Riikonen; J. Toivonen

doi:10.1088/0268-1242/19/11/012

Comparison of induced stresses due to electroless versus sputtered copper interconnect technology

P.J. McNally
, J. Kanatharana
, B.H.W. Toh
, D.W. McNeill
, T. Tuomi
, A.N. Danilewsky
, L. Knuuttila
, J. Riikonen
, J. Toivonen

Research output: Contribution to journal › Article › Scientific › peer-review

1 Citation (Scopus)

Translated title of the contribution	Comparison of induced stresses due to electroless versus sputtered copper interconnect technology
Original language	English
Pages (from-to)	1280-1284
Journal	Semiconductor Science and Technology
Volume	19
Issue number	11
DOIs	https://doi.org/10.1088/0268-1242/19/11/012
Publication status	Published - 2004
Externally published	Yes
Publication type	A1 Journal article-refereed

Publication forum classification

Publication forum level 1

Access to Document

10.1088/0268-1242/19/11/012

Cite this

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title = "Comparison of induced stresses due to electroless versus sputtered copper interconnect technology",

author = "P.J. McNally and J. Kanatharana and B.H.W. Toh and D.W. McNeill and T. Tuomi and A.N. Danilewsky and L. Knuuttila and J. Riikonen and J. Toivonen",

note = "Contribution: organisation=fys,FACT1=1",

year = "2004",

doi = "10.1088/0268-1242/19/11/012",

language = "English",

volume = "19",

pages = "1280--1284",

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TY - JOUR

T1 - Comparison of induced stresses due to electroless versus sputtered copper interconnect technology

AU - McNally, P.J.

AU - Kanatharana, J.

AU - Toh, B.H.W.

AU - McNeill, D.W.

AU - Tuomi, T.

AU - Danilewsky, A.N.

AU - Knuuttila, L.

AU - Riikonen, J.

AU - Toivonen, J.

N1 - Contribution: organisation=fys,FACT1=1

PY - 2004

Y1 - 2004

U2 - 10.1088/0268-1242/19/11/012

DO - 10.1088/0268-1242/19/11/012

M3 - Article

SN - 0268-1242

VL - 19

SP - 1280

EP - 1284

JO - Semiconductor Science and Technology

JF - Semiconductor Science and Technology

IS - 11

ER -