Directed self-assembly of high-chi block copolymer for fabrication of optical nanoresonator

Sozaraj Rasappa, Lars Schulte, Sokol Ndoni, Tapio Niemi

    Research output: Contribution to journalArticleScientificpeer-review

    5 Citations (Scopus)
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    In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. The nanostructured gratings or nanofins were fabricated by silicon-containing block copolymer on a chromium coated silicon-on-insulator substrate. Etch resistance of the block copolymer template enables a unique patterning technique for high-aspect-ratio silicon nanofins. Integration of the directed self-assembly with nanoimprint lithography provides a well-aligned array of nanofins with a depth of ~125 nm on a wafer scale. The developed nanopatterning method is an alternative to the previously reported nanopatterning techniques utilizing block copolymers. The dense array of sub-10 nm nanofins are used to realize a photonic guided-mode resonance filter. The nanostructured grating provides high sensitivity in refractive index sensing, as demonstrated by simulations and experiments in measuring varying contents of the tetrahydrofuran solvent.
    Original languageEnglish
    Pages (from-to)18306-18314
    Number of pages9
    Issue number10
    Publication statusPublished - 3 Sept 2018
    Publication typeA1 Journal article-refereed

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