Distress, Eustress, or No Stress? Explaining Smartphone Users' Different Technostress Responses

Markus Salo, Henri Pirkkalainen, Markus Makkonen, Riitta Hekkala

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

    6 Citations (Scopus)


    Technostress is common and has harmful consequences. Therefore, researchers have shown increasing interest in explaining technostress in the field of information systems (IS). While extant research merits in identifying the causes and consequences of technostress, it has not explained empirically why information technology (IT) users have different responses to similar potentially stressful IT events. Indeed, events such as smartphone failures can derive negative distress responses for some users and positive eustress responses for others. To address this gap in research, we conducted a qualitative study by interviewing users who had experienced smartphone failures. As a contribution, our findings uncover five distinct types of narratives for technostress responses and identify four perceptual dimensions that shape the corresponding responses. As such, we provide an initial answer to the call for understanding users’ different interpretations of potentially stressful IT events. Such knowledge can help promoting the favorable outcomes of IT use and minimizing the negative side effects.
    Original languageEnglish
    Title of host publicationInternational Conference on Information Systems (ICIS’2018)
    PublisherAssociation for Information Systems AIS
    ISBN (Electronic)978-0-9966831-7-3
    Publication statusPublished - 30 Oct 2018
    Publication typeA4 Article in conference proceedings
    EventInternational Conference on Information Systems -
    Duration: 1 Jan 1900 → …

    Publication series

    NameInternational Conference on Information Systems
    ISSN (Electronic)1026-1079


    ConferenceInternational Conference on Information Systems
    Period1/01/00 → …

    Publication forum classification

    • Publication forum level 2


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