Enhancement of bulk second-harmonic generation from silicon nitride films by material composition

K. Koskinen, R. Czaplicki, A. Slablab, T. Ning, A. Hermans, B. Kuyken, V. Mittal, G. S. Murugan, T. Niemi, R. Baets, M. Kauranen

    Research output: Contribution to journalArticleScientificpeer-review

    8 Citations (Scopus)


    We present a comprehensive tensorial characterization of second-harmonic generation from silicon nitride films with varying compositions. The samples were fabricated using plasma-enhanced chemical vapor deposition, and the material composition was varied by the reactive gas mixture in the process. We found a six-fold enhancement between the lowest and highest second-order susceptibility, with the highest value of approximately 5x00A0;pm/V from the most silicon-rich sample. Moreover, the optical losses were found to be sufficiently small (below 6x00A0;dB/cm) for applications. The tensorial results show that all samples retain in-plane isotropy independent of the silicon content, highlighting the controllability of the fabrication process.
    Original languageEnglish
    Pages (from-to)5030-5033
    Number of pages4
    JournalOptics Letters
    Issue number23
    Publication statusPublished - 1 Dec 2017
    Publication typeA1 Journal article-refereed


    • Nonlinear optics
    • Nonlinear optics, materials
    • Thin films, optical properties

    Publication forum classification

    • Publication forum level 2


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