Enhancement of bulk second-harmonic generation from silicon nitride films by material composition

Keyphrases

• Second Harmonic Generation 100%
• Tensorial 100%
• Silicon Nitride Film 100%
• Material Composition 100%
• Second-order Susceptibility 50%
• Fabrication Methods 50%
• Plasma-enhanced Chemical Vapor Deposition (PECVD) 50%
• Varying Composition 50%
• Optical Losses 50%
• In-plane Isotropy 50%
• Silicon-rich 50%
• Silicon Content 50%
• Reactive Gas 50%
• Gas Mixture 50%

Engineering

• Harmonic Generation 100%
• Nitride 100%
• Material Composition 100%
• Chemical Vapor Deposition 50%
• Vapor Deposition 50%
• Optical Loss 50%
• Silicon Content 50%
• Phase Composition 50%
• Controllability 50%
• Spatial Distribution 50%
• Gas Mixture 50%

Material Science

• Film 100%
• Silicon Nitride 100%
• Phase Composition 100%
• Silicon 66%
• Plasma-Enhanced Chemical Vapor Deposition 33%
• Optical Loss 33%
• Gas Mixture 33%