High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

Sozaraj Rasappa, Hanna Hulkkonen, Lars Schulte, Sokol Ndoni, Jarno Reuna, Turkka Salminen, Tapio Niemi

    Research output: Contribution to journalArticleScientificpeer-review

    10 Citations (Scopus)

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