Interference system for high pressure environment

Tero Kumpulainen; Amandeep Singh; Thomas März; Litong Dong; Jarno Reuna; Jorma Vihinen; Dayou Li; Erkki Levänen

doi:10.1016/j.optlastec.2021.107278

Interference system for high pressure environment

Tero Kumpulainen, Amandeep Singh, Thomas März, Litong Dong, Jarno Reuna, Jorma Vihinen, Dayou Li, Erkki Levänen

Research output: Contribution to journal › Article › Scientific › peer-review

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Abstract

Laser interference patterning or lithography has been used in variety of the applications using, patterning, masking and processing structures at top of material. It offers fast processing over as large areas can be processed simultaneously. Additionally, fine patterns are possible to achieve both in micro and sub-micro scale. In this manuscript is presented novel concept to combine interference patterning and high-pressure processing environment. With aid of high-pressure system, it is possible to control processing environment and add co-solvents in desired state (liquid, gas, supercritical) and use developed system as controlled reactive environment in the future studies. Two systems were developed and assembled for testing and proofing the concept. The results of the two 4-beam interference systems (lens- and mirror-based) are presented and compared.

Original language	English
Article number	107278
Number of pages	9
Journal	Optics and laser technology
Volume	142
DOIs	https://doi.org/10.1016/j.optlastec.2021.107278
Publication status	Published - Oct 2021
Publication type	A1 Journal article-refereed

Funding

The authors gratefully acknowledge the support from the EU H2020 Program “Nanostencil”. This work was supported by European Commission's Horizon 2020 project 'NanoStencil' – Grant number 767285. This work made use of Laboratory services facilities at Tampere University. This work was supported by European Commission's Horizon 2020 project 'NanoStencil' ? Grant number 767285. This work made use of Laboratory services facilities at Tampere University. The authors gratefully acknowledge the support from the EU H2020 Program ?Nanostencil?.

Keywords

High pressure CO
Laser Interference patterning
Laser material processing
Supercritical fluid

Publication forum classification

Publication forum level 1

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Electrical and Electronic Engineering

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10.1016/j.optlastec.2021.107278Licence: CC BY

Interference system for high pressure environment
CC BY
Final published version, 18.6 MBLicence: CC BY

http://urn.fi/URN:NBN:fi:tuni-202106216002Licence: CC BY

Cite this

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title = "Interference system for high pressure environment",

abstract = "Laser interference patterning or lithography has been used in variety of the applications using, patterning, masking and processing structures at top of material. It offers fast processing over as large areas can be processed simultaneously. Additionally, fine patterns are possible to achieve both in micro and sub-micro scale. In this manuscript is presented novel concept to combine interference patterning and high-pressure processing environment. With aid of high-pressure system, it is possible to control processing environment and add co-solvents in desired state (liquid, gas, supercritical) and use developed system as controlled reactive environment in the future studies. Two systems were developed and assembled for testing and proofing the concept. The results of the two 4-beam interference systems (lens- and mirror-based) are presented and compared.",

keywords = "High pressure CO, Laser Interference patterning, Laser material processing, Supercritical fluid",

author = "Tero Kumpulainen and Amandeep Singh and Thomas M{\"a}rz and Litong Dong and Jarno Reuna and Jorma Vihinen and Dayou Li and Erkki Lev{\"a}nen",

note = "Funding Information: The authors gratefully acknowledge the support from the EU H2020 Program “Nanostencil”. Funding Information: This work was supported by European Commission's Horizon 2020 project 'NanoStencil' – Grant number 767285. This work made use of Laboratory services facilities at Tampere University. Funding Information: This work was supported by European Commission's Horizon 2020 project 'NanoStencil' ? Grant number 767285. This work made use of Laboratory services facilities at Tampere University. The authors gratefully acknowledge the support from the EU H2020 Program ?Nanostencil?. Publisher Copyright: {\textcopyright} 2021 The Authors",

year = "2021",

month = oct,

doi = "10.1016/j.optlastec.2021.107278",

language = "English",

volume = "142",

journal = "Optics and laser technology",

issn = "0030-3992",

publisher = "Elsevier",

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TY - JOUR

T1 - Interference system for high pressure environment

AU - Kumpulainen, Tero

AU - Singh, Amandeep

AU - März, Thomas

AU - Dong, Litong

AU - Reuna, Jarno

AU - Vihinen, Jorma

AU - Li, Dayou

AU - Levänen, Erkki

N1 - Funding Information: The authors gratefully acknowledge the support from the EU H2020 Program “Nanostencil”. Funding Information: This work was supported by European Commission's Horizon 2020 project 'NanoStencil' – Grant number 767285. This work made use of Laboratory services facilities at Tampere University. Funding Information: This work was supported by European Commission's Horizon 2020 project 'NanoStencil' ? Grant number 767285. This work made use of Laboratory services facilities at Tampere University. The authors gratefully acknowledge the support from the EU H2020 Program ?Nanostencil?. Publisher Copyright: © 2021 The Authors

PY - 2021/10

Y1 - 2021/10

N2 - Laser interference patterning or lithography has been used in variety of the applications using, patterning, masking and processing structures at top of material. It offers fast processing over as large areas can be processed simultaneously. Additionally, fine patterns are possible to achieve both in micro and sub-micro scale. In this manuscript is presented novel concept to combine interference patterning and high-pressure processing environment. With aid of high-pressure system, it is possible to control processing environment and add co-solvents in desired state (liquid, gas, supercritical) and use developed system as controlled reactive environment in the future studies. Two systems were developed and assembled for testing and proofing the concept. The results of the two 4-beam interference systems (lens- and mirror-based) are presented and compared.

AB - Laser interference patterning or lithography has been used in variety of the applications using, patterning, masking and processing structures at top of material. It offers fast processing over as large areas can be processed simultaneously. Additionally, fine patterns are possible to achieve both in micro and sub-micro scale. In this manuscript is presented novel concept to combine interference patterning and high-pressure processing environment. With aid of high-pressure system, it is possible to control processing environment and add co-solvents in desired state (liquid, gas, supercritical) and use developed system as controlled reactive environment in the future studies. Two systems were developed and assembled for testing and proofing the concept. The results of the two 4-beam interference systems (lens- and mirror-based) are presented and compared.

KW - High pressure CO

KW - Laser Interference patterning

KW - Laser material processing

KW - Supercritical fluid

U2 - 10.1016/j.optlastec.2021.107278

DO - 10.1016/j.optlastec.2021.107278

M3 - Article

AN - SCOPUS:85107152164

SN - 0030-3992

VL - 142

JO - Optics and laser technology

JF - Optics and laser technology

M1 - 107278

ER -

Interference system for high pressure environment

Abstract

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