Investigation of Switching Time in GaN/AlN Resonant Tunneling Diodes by Experiments and P-SPICE Models

W.-D. Zhang, T. A. Growden, D. F. Storm, D. J. Meyer, P. R. Berger, E. R. Brown

Research output: Contribution to journalArticleScientificpeer-review

14 Citations (Scopus)
43 Downloads (Pure)

Abstract

The experimental and simulated switching behavior across the negative differential resistance (NDR) region of GaN/AlN double-barrier resonant tunneling diodes (RTDs) is presented. The shortest 10%-90% experimental switching time was ∼55 ps. The experimental results are also studied with P-SPICE circuit models, which show that the relatively low peak-to-valley current ratio (∼1.5), relatively high specific contact resistance (≥1 × 10-6 Ω-cm2), and relatively large specific capacitance limit the switching time.

Original languageEnglish
Article number8933349
Pages (from-to)75-79
Number of pages5
JournalIEEE Transactions on Electron Devices
Volume67
Issue number1
DOIs
Publication statusPublished - Jan 2020
Publication typeA1 Journal article-refereed

Keywords

  • GaN/AlN
  • heterostructure
  • measurement
  • modeling
  • P-SPICE
  • resonant tunneling diode (RTD)
  • switching time

Publication forum classification

  • Publication forum level 2

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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