Low sidewall damage plasma etching with ICP-RIE and HBr chemistry of Si/SiGe resonant interband tunnel diodes

Si Young Park, Sung Yong Chung, Ronghua Yu, Paul R. Berger, Phillip E. Thompson

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

Original language	English
Title of host publication	2005 International Semiconductor Device Research Symposium
Pages	151-152
Number of pages	2
DOIs	https://doi.org/10.1109/ISDRS.2005.1596026
Publication status	Published - 2005
Externally published	Yes
Publication type	A4 Article in conference proceedings
Event	International Semiconductor Device Research Symposium - Bethesda, MD, United States Duration: 7 Dec 2005 → 9 Dec 2005

Conference	International Semiconductor Device Research Symposium
Country/Territory	United States
City	Bethesda, MD
Period	7/12/05 → 9/12/05

ASJC Scopus subject areas

@inproceedings{d855f4dd3399464d8a9e1a0ba483a36e,

title = "Low sidewall damage plasma etching with ICP-RIE and HBr chemistry of Si/SiGe resonant interband tunnel diodes",

author = "Park, {Si Young} and Chung, {Sung Yong} and Ronghua Yu and Berger, {Paul R.} and Thompson, {Phillip E.}",

year = "2005",

doi = "10.1109/ISDRS.2005.1596026",

language = "English",

isbn = "1424400848",

pages = "151--152",

booktitle = "2005 International Semiconductor Device Research Symposium",

}

Park, SY, Chung, SY, Yu, R, Berger, PR & Thompson, PE 2005, Low sidewall damage plasma etching with ICP-RIE and HBr chemistry of Si/SiGe resonant interband tunnel diodes. in 2005 International Semiconductor Device Research Symposium., 1596026, pp. 151-152, International Semiconductor Device Research Symposium, Bethesda, MD, United States, 7/12/05. https://doi.org/10.1109/ISDRS.2005.1596026

Low sidewall damage plasma etching with ICP-RIE and HBr chemistry of Si/SiGe resonant interband tunnel diodes. / Park, Si Young; Chung, Sung Yong; Yu, Ronghua et al.
2005 International Semiconductor Device Research Symposium. 2005. p. 151-152 1596026.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Low sidewall damage plasma etching with ICP-RIE and HBr chemistry of Si/SiGe resonant interband tunnel diodes

AU - Park, Si Young

AU - Chung, Sung Yong

AU - Yu, Ronghua

AU - Berger, Paul R.

AU - Thompson, Phillip E.

PY - 2005

Y1 - 2005

U2 - 10.1109/ISDRS.2005.1596026

DO - 10.1109/ISDRS.2005.1596026

M3 - Conference contribution

AN - SCOPUS:33847238406

SN - 1424400848

SN - 9781424400843

SP - 151

EP - 152

BT - 2005 International Semiconductor Device Research Symposium

T2 - International Semiconductor Device Research Symposium

Y2 - 7 December 2005 through 9 December 2005

ER -