Abstract
Cylinder-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS, 27.2k-b-11.7k, SD39) block copolymer having a total molecular weight of 39 kg mol−1 was exploited to achieve in-plane morphologies of lines, dots and antidots. Brush-free self-assembly of the SD39 on silicon substrates was investigated using solvents that were PS or PDMS selective, neutral and non-solvents based on their Hansen solubility parameters. The different morphologies were achieved with annealing times ranging from 10 min to 1 h at room temperature. The SD39 patterns were used as an etch mask for transferring the pattern into the underlying substrate. Directed self-assembly and hierarchical directed self-assembly on block copolymer templates for confinement of dots was successfully demonstrated. The strategy for achieving multiple morphologies using one BCP by mere choice of the annealing solvents on unmodified substrates provides a simplified method for surface nanopatterning, templated growth of nanomaterials and nanofabrication.
| Original language | English |
|---|---|
| Pages (from-to) | 1-7 |
| Number of pages | 7 |
| Journal | Microelectronic Engineering |
| Volume | 192 |
| DOIs | |
| Publication status | Published - 15 May 2018 |
| Publication type | A1 Journal article-refereed |
Keywords
- Block copolymer
- Hansen solubility
- Hierarchical self-assembly
- Selective solvent
Publication forum classification
- Publication forum level 1
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering