Multiscale modeling of anisotropic wet chemical etching of crystalline silicon

M.A. Gosalvez, A.S. Foster, R.M. Nieminen

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Translated title of the contribution	Multiscale modeling of anisotropic wet chemical etching of crystalline silicon
Original language	English
Pages (from-to)	467-473
Journal	EPL
Volume	60
Issue number	3
DOIs	https://doi.org/10.1209/epl/i2002-00287-1
Publication status	Published - 2002
Externally published	Yes
Publication type	A1 Journal article-refereed

Publication forum classification

@article{d415f3c8a5834a65afc529ffe66dac3e,

title = "Multiscale modeling of anisotropic wet chemical etching of crystalline silicon",

author = "M.A. Gosalvez and A.S. Foster and R.M. Nieminen",

note = "Contribution: organisation=fys,FACT1=1",

year = "2002",

doi = "10.1209/epl/i2002-00287-1",

language = "English",

volume = "60",

pages = "467--473",

journal = "EPL",

issn = "0295-5075",

publisher = "IOP Publishing Ltd.",

number = "3",

}