Abstract
We show that nanoimprint lithography combined with electron-beam evaporation provides a cost-efficient, rapid, and reproducible method to fabricate conical nanostructures with very sharp tips on flat surfaces in high volumes. We demonstrate the method by preparing a wafer-scale array of gold nanocones with an average tip radius of 5 nm. Strong local fields at the tips enhance the second-harmonic generation by over 2 orders of magnitude compared with a nonsharp reference.
Translated title of the contribution | Nanoimprint fabrication of gold nanocones with ~10nm tips for enhanced optical interactions |
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Original language | English |
Pages (from-to) | 1979-1981 |
Journal | Optics Letters |
Volume | 34 |
Issue number | 13 |
DOIs | |
Publication status | Published - 2009 |
Publication type | A1 Journal article-refereed |
Publication forum classification
- Publication forum level 2