Novel method for intensity correction using a simple maskless lithography device

Dhanesh Kattipparambil Rajan, Jukka-Pekka Raunio, Markus Tapani Karjalainen, Tomi Ryynänen, Jukka Lekkala

    Research output: Contribution to journalArticleScientificpeer-review

    5 Citations (Scopus)
    Translated title of the contributionNovel method for intensity correction using a simple maskless lithography device
    Original languageEnglish
    Pages (from-to)40-46
    Number of pages7
    JournalSensors and Actuators A: Physical
    Volume194
    DOIs
    Publication statusPublished - 2013
    Publication typeA1 Journal article-refereed

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