Optical interference lithography using azobenzene-functionalized polymers for micro-and nanopatterning of silicon

Aleksandr Kravchenko; Andriy Shevchenko; Victor Ovchinnikov; Arri Priimagi; Matti Kaivola

doi:10.1002/adma.201101888

Optical interference lithography using azobenzene-functionalized polymers for micro-and nanopatterning of silicon

Aleksandr Kravchenko, Andriy Shevchenko, Victor Ovchinnikov, Arri Priimagi, Matti Kaivola

Research output: Contribution to journal › Article › Scientific › peer-review

115 Citations (Scopus)

Abstract

Light-induced mass transport in azobenzene-functionalized polymers is exploited in optical interference lithography to fabricate large-area, periodic 1D and 2D silicon nanostructures. The demonstrated technique is a fast, reliable, and cost-effective alternative to conventional photoresist-based methods of nano-and microfabrication. Potential applications of the technique range from optics and photonics to functional materials and coatings.

Original language	English
Pages (from-to)	4174-4177
Number of pages	4
Journal	Advanced Materials
Volume	23
Issue number	36
DOIs	https://doi.org/10.1002/adma.201101888
Publication status	Published - 22 Sept 2011
Publication type	A1 Journal article-refereed

Keywords

azobenzene
lithography
nanopatterning
surface-relief grating

ASJC Scopus subject areas

General Materials Science
Mechanics of Materials
Mechanical Engineering

Access to Document

10.1002/adma.201101888

Cite this

@article{844a36787c6e4b058cc8ac92150d2d74,

title = "Optical interference lithography using azobenzene-functionalized polymers for micro-and nanopatterning of silicon",

abstract = "Light-induced mass transport in azobenzene-functionalized polymers is exploited in optical interference lithography to fabricate large-area, periodic 1D and 2D silicon nanostructures. The demonstrated technique is a fast, reliable, and cost-effective alternative to conventional photoresist-based methods of nano-and microfabrication. Potential applications of the technique range from optics and photonics to functional materials and coatings.",

keywords = "azobenzene, lithography, nanopatterning, surface-relief grating",

author = "Aleksandr Kravchenko and Andriy Shevchenko and Victor Ovchinnikov and Arri Priimagi and Matti Kaivola",

year = "2011",

month = sep,

day = "22",

doi = "10.1002/adma.201101888",

language = "English",

volume = "23",

pages = "4174--4177",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "36",

}

TY - JOUR

T1 - Optical interference lithography using azobenzene-functionalized polymers for micro-and nanopatterning of silicon

AU - Kravchenko, Aleksandr

AU - Shevchenko, Andriy

AU - Ovchinnikov, Victor

AU - Priimagi, Arri

AU - Kaivola, Matti

PY - 2011/9/22

Y1 - 2011/9/22

N2 - Light-induced mass transport in azobenzene-functionalized polymers is exploited in optical interference lithography to fabricate large-area, periodic 1D and 2D silicon nanostructures. The demonstrated technique is a fast, reliable, and cost-effective alternative to conventional photoresist-based methods of nano-and microfabrication. Potential applications of the technique range from optics and photonics to functional materials and coatings.

AB - Light-induced mass transport in azobenzene-functionalized polymers is exploited in optical interference lithography to fabricate large-area, periodic 1D and 2D silicon nanostructures. The demonstrated technique is a fast, reliable, and cost-effective alternative to conventional photoresist-based methods of nano-and microfabrication. Potential applications of the technique range from optics and photonics to functional materials and coatings.

KW - azobenzene

KW - lithography

KW - nanopatterning

KW - surface-relief grating

UR - https://www.scopus.com/pages/publications/80053199536

U2 - 10.1002/adma.201101888

DO - 10.1002/adma.201101888

M3 - Article

C2 - 21823180

AN - SCOPUS:80053199536

SN - 0935-9648

VL - 23

SP - 4174

EP - 4177

JO - Advanced Materials

JF - Advanced Materials

IS - 36

ER -

Optical interference lithography using azobenzene-functionalized polymers for micro-and nanopatterning of silicon

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this