Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques

Z. Ji, J. Zhang, S.M. Olaizola, Y.K. Verevkin, C. Peng, C. Tan, T. Berthou, S. Tisserand, Z. Wang

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

5 Citations (Scopus)

Translated title of the contribution	Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques
Original language	English
Title of host publication	Proceedings of the 2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, 9-12 August 2009, Changchun, China
Pages	1835-1840
Publication status	Published - 2009
Publication type	A4 Article in conference proceedings

Publication forum classification

Ji, Z., Zhang, J., Olaizola, S. M., Verevkin, Y. K., Peng, C., Tan, C., Berthou, T., Tisserand, S., & Wang, Z. (2009). Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques. In Proceedings of the 2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, 9-12 August 2009, Changchun, China (pp. 1835-1840)

@inproceedings{a854d599b8494feeab3f8447bd7eb721,

title = "Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques",

author = "Z. Ji and J. Zhang and S.M. Olaizola and Y.K. Verevkin and C. Peng and C. Tan and T. Berthou and S. Tisserand and Z. Wang",

note = "Contribution: organisation=orc,FACT1=1",

year = "2009",

language = "English",

isbn = "978-1-4244-2693-5",

pages = "1835--1840",

booktitle = "Proceedings of the 2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, 9-12 August 2009, Changchun, China",

}

Ji, Z, Zhang, J, Olaizola, SM, Verevkin, YK, Peng, C, Tan, C, Berthou, T, Tisserand, S & Wang, Z 2009, Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques. in Proceedings of the 2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, 9-12 August 2009, Changchun, China. pp. 1835-1840.

Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques. / Ji, Z.; Zhang, J.; Olaizola, S.M. et al.
Proceedings of the 2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, 9-12 August 2009, Changchun, China. 2009. p. 1835-1840.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques

AU - Ji, Z.

AU - Zhang, J.

AU - Olaizola, S.M.

AU - Verevkin, Y.K.

AU - Peng, C.

AU - Tan, C.

AU - Berthou, T.

AU - Tisserand, S.

AU - Wang, Z.

N1 - Contribution: organisation=orc,FACT1=1

PY - 2009

Y1 - 2009

M3 - Conference contribution

SN - 978-1-4244-2693-5

SP - 1835

EP - 1840

BT - Proceedings of the 2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, 9-12 August 2009, Changchun, China

ER -