Site-controlled InAs quantum dots by nanoimprint lithography and molecular beam epitaxy

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific

Original language	English
Title of host publication	ICPS 2012 - 31st International Conference on the Physics of Semiconductors, July 29 - Aug 3, 2012, Zurich, Switzerland
Publication status	Published - 2012
Publication type	B3 Article in conference proceedings

Cite this

@inproceedings{31bfe0096236448685d5acbe17978ccd,

title = "Site-controlled InAs quantum dots by nanoimprint lithography and molecular beam epitaxy",

author = "Andreas Schramm and Hakkarainen, \{Teemu Valtteri\} and Juha Tommila and Mircea Guina and Christian Strelow and Tobias Kipp",

note = "xposter",

year = "2012",

language = "English",

booktitle = "ICPS 2012 - 31st International Conference on the Physics of Semiconductors, July 29 - Aug 3, 2012, Zurich, Switzerland",

}

Site-controlled InAs quantum dots by nanoimprint lithography and molecular beam epitaxy. / Schramm, Andreas; Hakkarainen, Teemu Valtteri; Tommila, Juha et al.
ICPS 2012 - 31st International Conference on the Physics of Semiconductors, July 29 - Aug 3, 2012, Zurich, Switzerland. 2012.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific

TY - GEN

T1 - Site-controlled InAs quantum dots by nanoimprint lithography and molecular beam epitaxy

AU - Schramm, Andreas

AU - Hakkarainen, Teemu Valtteri

AU - Tommila, Juha

AU - Guina, Mircea

AU - Strelow, Christian

AU - Kipp, Tobias

N1 - xposter

PY - 2012

Y1 - 2012

M3 - Conference contribution

BT - ICPS 2012 - 31st International Conference on the Physics of Semiconductors, July 29 - Aug 3, 2012, Zurich, Switzerland

ER -