Soft graphoepitaxy for large area directed self-assembly of polystyrene-block-poly(dimethylsiloxane) block copolymer on nanopatterned poss substrates fabricated by nanoimprint lithography
- Dipu Borah*
- , Sozaraj Rasappa
- , Mathieu Salaun
- , Marc Zellsman
- , Olivier Lorret
- , George Liontos
- , Konstantinos Ntetsikas
- , Apostolos Avgeropoulos
- , Michael A. Morris
*Corresponding author for this work
Research output: Contribution to journal › Article › Scientific › peer-review
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Citations
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