Soft UV-nanoimprint lithography for the fabrication of frequency selective components

J. Viheriälä; J. Tommila; A. Laakso; S. Ranta; I. Vartiainen; H. Tuovinen; J. Telkkälä; T. Vallius; T. Niemi; M. Dumitrescu; M. Pessa

Soft UV-nanoimprint lithography for the fabrication of frequency selective components

J. Viheriälä, J. Tommila, A. Laakso, S. Ranta, I. Vartiainen, H. Tuovinen, J. Telkkälä, T. Vallius, T. Niemi, M. Dumitrescu, M. Pessa

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Scientific › peer-review

Translated title of the contribution	Soft UV-nanoimprint lithography for the fabrication of frequency selective components
Original language	English
Title of host publication	CLEO Europe - EQEC 2009, 14 - 19 June 2009, Munich, Germany
Pages	1 p
Publication status	Published - 2009
Publication type	A4 Article in conference proceedings

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Cite this

@inproceedings{1601b259c5df4710bfe2d708f8516490,

title = "Soft UV-nanoimprint lithography for the fabrication of frequency selective components",

author = "J. Viheri{\"a}l{\"a} and J. Tommila and A. Laakso and S. Ranta and I. Vartiainen and H. Tuovinen and J. Telkk{\"a}l{\"a} and T. Vallius and T. Niemi and M. Dumitrescu and M. Pessa",

note = "Contribution: organisation=orc,FACT1=1",

year = "2009",

language = "English",

isbn = "978-1-4244-4080-1",

pages = "1 p",

booktitle = "CLEO Europe - EQEC 2009, 14 - 19 June 2009, Munich, Germany",

}

TY - GEN

T1 - Soft UV-nanoimprint lithography for the fabrication of frequency selective components

AU - Viheriälä, J.

AU - Tommila, J.

AU - Laakso, A.

AU - Ranta, S.

AU - Vartiainen, I.

AU - Tuovinen, H.

AU - Telkkälä, J.

AU - Vallius, T.

AU - Niemi, T.

AU - Dumitrescu, M.

AU - Pessa, M.

N1 - Contribution: organisation=orc,FACT1=1

PY - 2009

Y1 - 2009

M3 - Conference contribution

SN - 978-1-4244-4080-1

SP - 1 p

BT - CLEO Europe - EQEC 2009, 14 - 19 June 2009, Munich, Germany

ER -