Use of nanostructured alumina thin films in multilayer anti-reflective coatings

Jarno Reuna, Arto Aho, Riku Isoaho, Marianna Raappana, Timo Aho, Elina Anttola, Arttu Hietalahti, Antti Tukiainen, Mircea Guina

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A new method for modification of planar multilayer structures to create nanostructured aluminum oxide anti-reflection coatings is reported. The method is non-toxic and low-cost, being based on treatment of the coating with heated de-ionized water after the deposition of aluminum oxide. The results show that the method provides a viable alternative for attaining a low reflectance ARC. In particular, a low average reflectivity of ∼3.3% is demonstrated in a broadband spectrum extending from 400 nm to 2000 nm for ARCs deposited on GaInP solar-cells, the typical material used as top-junction in solar cell tandem architectures. Moreover, the process is compatible with volume manufacturing technologies used in photovoltaics, such as ion beam sputtering and electron beam evaporation.

Original languageEnglish
Article number215602
Number of pages9
Issue number21
Publication statusPublished - 2021
Publication typeA1 Journal article-refereed


  • Aluminum oxide
  • De-ionized water
  • Multilayer
  • Porosity
  • Thin film coatings

Publication forum classification

  • Publication forum level 2

ASJC Scopus subject areas

  • Bioengineering
  • General Chemistry
  • General Materials Science
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering


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