Advantages of polarized two-beam second-harmonic generation in precise characterization of thin films

Julkaisun otsikon käännös: Advantages of polarized two-beam second-harmonic generation in precise characterization of thin films

S. Cattaneo, E. Vuorimaa, H. Lemmetyinen, M. Kauranen

    Tutkimustuotos: ArtikkeliScientificvertaisarvioitu

    19 Sitaatiot (Scopus)
    69 Lataukset (Pure)

    Abstrakti

    Polarized second-harmonic generation using two fundamental beams, instead of one, offers significant advantages for characterizing nonlinear optical thin films. The technique is more precise and allows the internal consistency of the results to be verified. The superiority of the two-beam arrangement over the traditional single-beam arrangement is demonstrated by determining the susceptibility tensors of Langmuir–Blodgett films. We show that, for a well-understood reference sample, the results obtained using two fundamental beams agree qualitatively with those obtained with a single fundamental beam, but are more precise. In a more complicated situation, however, the single-beam technique appears to work well but yields results that are, in fact, incorrect. The two-beam technique, instead, yields clearly inconsistent results, thereby highlighting systematic errors in the experimental arrangement or in the theoretical model used to interpret the results.
    Julkaisun otsikon käännösAdvantages of polarized two-beam second-harmonic generation in precise characterization of thin films
    AlkuperäiskieliEnglanti
    Sivut9245-9252
    JulkaisuJournal of Chemical Physics
    Vuosikerta120
    DOI - pysyväislinkit
    TilaJulkaistu - 2004
    OKM-julkaisutyyppiA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

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