Fabrication of topographically microstructured titanium silicide interface for advanced photonic applications

Markku Hannula; Kimmo  Lahtonen; Harri Ali-Löytty; A.A. Zakharov; Tero Isotalo; Jesse Saari; Mika Valden

doi:10.1016/j.scriptamat.2016.03.016

Fabrication of topographically microstructured titanium silicide interface for advanced photonic applications

Markku Hannula, Kimmo Lahtonen, Harri Ali-Löytty, A.A. Zakharov, Tero Isotalo, Jesse Saari, Mika Valden

Tutkimustuotos: Artikkeli › Tieteellinen › vertaisarvioitu

14 Sitaatiot (Scopus)

56 Lataukset (Pure)

Abstrakti

We present a widely scalable, high temperature post-growth annealing method for converting ultra-thin films of TiO2 grown by atomic layer deposition to topographically microstructured titanium silicide (TiSi). The photoemission electron microscopy results reveal that the transformation from TiO2 to TiSi at 950 °C proceeds via island formation. Inside the islands, TiO2 reduction and Si diffusion play important roles in the formation of the highly topographically microstructured TiSi interface with laterally nonuniform barrier height contact. This is advantageous for efficient charge transfer in Si-based heterostructures for photovoltaic and photoelectrochemical applications.

Alkuperäiskieli	Englanti
Sivut	76-81
Sivumäärä	6
Julkaisu	Scripta Materialia
Vuosikerta	119
DOI - pysyväislinkit	https://doi.org/10.1016/j.scriptamat.2016.03.016
Tila	Julkaistu - heinäk. 2016
OKM-julkaisutyyppi	A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Julkaisufoorumi-taso

Jufo-taso 3

YK:n kestävän kehityksen tavoitteet

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10.1016/j.scriptamat.2016.03.016

Hannula et al - Fabrication of topographically microstructured titanium silicide
© 2016. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/
Accepted author manuscript, 8,25 MB

http://urn.fi/URN:NBN:fi:tty-201605274188

14 Viittaukset
1 Tutkimusraportti

Transformation of ALD grown TiO2 film to topographically microstructured titanium silicide for photonics applications
Hannula, M., Lahtonen, K., Ali-Löytty, H., Zakharov, A. A., Isotalo, T., Saari, J. & Valden, M., 2016, Lund: Lund University, MAX IV Laboratory. 2 Sivumäärä
Tutkimustuotos: Tutkimusraportti

Open access

Fotoniikan materiaalit
Tukiainen, A. (Yhteyshenkilö) & Lahtonen, K. (Yhteyshenkilö)
Fysiikka
Laitteistot/tilat: Facility
Materiaalikarakterisointi (fysiikka)
Lahtonen, K. (Yhteyshenkilö) & Tukiainen, A. (Yhteyshenkilö)
Fysiikka
Laitteistot/tilat: Facility
MAX IV Laboratorio – FIMAX konsortio
Valden, M. (Yhteyshenkilö), Hirsimäki, M. (Yhteyshenkilö), Palmolahti, L. (Yhteyshenkilö) & Lahtonen, K. (Yhteyshenkilö)
Tekniikan ja luonnontieteiden tiedekunta
Laitteistot/tilat: Facility

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@article{250e61a7aafd490fa316631b16d77811,

title = "Fabrication of topographically microstructured titanium silicide interface for advanced photonic applications",

abstract = "We present a widely scalable, high temperature post-growth annealing method for converting ultra-thin films of TiO2 grown by atomic layer deposition to topographically microstructured titanium silicide (TiSi). The photoemission electron microscopy results reveal that the transformation from TiO2 to TiSi at 950 °C proceeds via island formation. Inside the islands, TiO2 reduction and Si diffusion play important roles in the formation of the highly topographically microstructured TiSi interface with laterally nonuniform barrier height contact. This is advantageous for efficient charge transfer in Si-based heterostructures for photovoltaic and photoelectrochemical applications.",

keywords = "Atomic layer deposition (ALD), X-ray photoelectron spectroscopy (XPS), Transition metal silicides, Semiconductors, Surface modification",

author = "Markku Hannula and Kimmo Lahtonen and Harri Ali-L{\"o}ytty and A.A. Zakharov and Tero Isotalo and Jesse Saari and Mika Valden",

year = "2016",

month = jul,

doi = "10.1016/j.scriptamat.2016.03.016",

language = "English",

volume = "119",

pages = "76--81",

journal = "Scripta Materialia",

issn = "1359-6462",

publisher = "Acta Materialia Inc",

}

TY - JOUR

T1 - Fabrication of topographically microstructured titanium silicide interface for advanced photonic applications

AU - Hannula, Markku

AU - Lahtonen, Kimmo

AU - Ali-Löytty, Harri

AU - Zakharov, A.A.

AU - Isotalo, Tero

AU - Saari, Jesse

AU - Valden, Mika

PY - 2016/7

Y1 - 2016/7

N2 - We present a widely scalable, high temperature post-growth annealing method for converting ultra-thin films of TiO2 grown by atomic layer deposition to topographically microstructured titanium silicide (TiSi). The photoemission electron microscopy results reveal that the transformation from TiO2 to TiSi at 950 °C proceeds via island formation. Inside the islands, TiO2 reduction and Si diffusion play important roles in the formation of the highly topographically microstructured TiSi interface with laterally nonuniform barrier height contact. This is advantageous for efficient charge transfer in Si-based heterostructures for photovoltaic and photoelectrochemical applications.

AB - We present a widely scalable, high temperature post-growth annealing method for converting ultra-thin films of TiO2 grown by atomic layer deposition to topographically microstructured titanium silicide (TiSi). The photoemission electron microscopy results reveal that the transformation from TiO2 to TiSi at 950 °C proceeds via island formation. Inside the islands, TiO2 reduction and Si diffusion play important roles in the formation of the highly topographically microstructured TiSi interface with laterally nonuniform barrier height contact. This is advantageous for efficient charge transfer in Si-based heterostructures for photovoltaic and photoelectrochemical applications.

KW - Atomic layer deposition (ALD)

KW - X-ray photoelectron spectroscopy (XPS)

KW - Transition metal silicides

KW - Semiconductors

KW - Surface modification

U2 - 10.1016/j.scriptamat.2016.03.016

DO - 10.1016/j.scriptamat.2016.03.016

M3 - Article

SN - 1359-6462

VL - 119

SP - 76

EP - 81

JO - Scripta Materialia

JF - Scripta Materialia

ER -

Fabrication of topographically microstructured titanium silicide interface for advanced photonic applications

Abstrakti

Julkaisufoorumi-taso

YK:n kestävän kehityksen tavoitteet

Pääsy asiakirjaan

Sormenjälki

Tutkimustuotos

Transformation of ALD grown TiO2 film to topographically microstructured titanium silicide for photonics applications

Laitteet

Fotoniikan materiaalit

Materiaalikarakterisointi (fysiikka)

MAX IV Laboratorio – FIMAX konsortio

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