Low-Temperature Route to Direct Amorphous to Rutile Crystallization of TiO₂Thin Films Grown by Atomic Layer Deposition

Engineering & Materials Science

• Atomic layer deposition 100%
• Crystallization 71%
• Titanium dioxide 68%
• Thin films 61%
• Growth temperature 42%
• Nucleation 27%
• Temperature 26%
• Annealing 25%
• Crystals 25%
• Titanium 25%
• Nitrogen 24%
• Oxides 22%
• Fabrication 19%
• Defects 17%
• Refractive index 17%
• Physicochemical properties 16%
• Crystal structure 16%
• Photonics 14%
• Energy gap 14%
• Permittivity 13%
• Substrates 9%
• Water 7%

Physics & Astronomy

• rutile 68%
• atomic layer epitaxy 67%
• routes 54%
• crystallization 50%
• anatase 35%
• thin films 27%
• titanium 18%
• nucleation 16%
• temperature 16%
• nitrogen 15%
• oxides 13%
• fabrication 13%
• annealing 13%
• defects 12%
• titanium oxides 11%
• crystals 10%
• crystal structure 8%
• refractivity 7%
• permittivity 7%
• photonics 7%
• water 6%

Chemical Compounds

• Atomic Layer Epitaxy 75%
• Rutile 64%
• Crystallization 45%
• Amorphous Material 45%
• Liquid Film 31%
• Titanium Dioxide 30%
• Crystal Nucleation 26%
• Annealing 14%
• Nitrogen 11%
• Oxide 10%
• Refractive Index 8%
• Application 8%
• Dielectric Constant 8%
• Band Gap 7%
• Crystal Structure 4%