Morphology evolution of PS-b-PDMS block copolymer and its hierarchical directed self-assembly on block copolymer templates

Sozaraj Rasappa; Lars Schulte; Dipu Borah; Hanna Hulkkonen; Sokol Ndoni; Turkka Salminen; Ramsankar Senthamaraikanan; Michael A. Morris; Tapio Niemi

doi:10.1016/j.mee.2018.02.002

Morphology evolution of PS-b-PDMS block copolymer and its hierarchical directed self-assembly on block copolymer templates

Sozaraj Rasappa^*
, Lars Schulte
, Dipu Borah
, Hanna Hulkkonen
, Sokol Ndoni
, Turkka Salminen
, Ramsankar Senthamaraikanan
, Michael A. Morris
, Tapio Niemi

^*Tämän työn vastaava kirjoittaja

Tutkimustuotos: Artikkeli › Tieteellinen › vertaisarvioitu

14 Sitaatiot (Scopus)

Abstrakti

Cylinder-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS, 27.2k-b-11.7k, SD39) block copolymer having a total molecular weight of 39 kg mol⁻¹ was exploited to achieve in-plane morphologies of lines, dots and antidots. Brush-free self-assembly of the SD39 on silicon substrates was investigated using solvents that were PS or PDMS selective, neutral and non-solvents based on their Hansen solubility parameters. The different morphologies were achieved with annealing times ranging from 10 min to 1 h at room temperature. The SD39 patterns were used as an etch mask for transferring the pattern into the underlying substrate. Directed self-assembly and hierarchical directed self-assembly on block copolymer templates for confinement of dots was successfully demonstrated. The strategy for achieving multiple morphologies using one BCP by mere choice of the annealing solvents on unmodified substrates provides a simplified method for surface nanopatterning, templated growth of nanomaterials and nanofabrication.

Alkuperäiskieli	Englanti
Sivut	1-7
Sivumäärä	7
Julkaisu	Microelectronic Engineering
Vuosikerta	192
DOI - pysyväislinkit	https://doi.org/10.1016/j.mee.2018.02.002
Tila	Julkaistu - 15 toukok. 2018
OKM-julkaisutyyppi	A1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Rahoitus

Financial support for this work is provided by Tampere University of Technology-TUT Postdoc Grant (grant 83289), Center for Nano-structured Graphene sponsored by the Danish National Research Foundation (Project DNRF58, by the EU FP7 NMP project) and Science Foundation Ireland (SFI) AMBER Centre (grant 12/RC/2278).

Julkaisufoorumi-taso

Jufo-taso 1

!!ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

Pääsy asiakirjaan

10.1016/j.mee.2018.02.002

Siteeraa tätä

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title = "Morphology evolution of PS-b-PDMS block copolymer and its hierarchical directed self-assembly on block copolymer templates",

abstract = "Cylinder-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS, 27.2k-b-11.7k, SD39) block copolymer having a total molecular weight of 39 kg mol−1 was exploited to achieve in-plane morphologies of lines, dots and antidots. Brush-free self-assembly of the SD39 on silicon substrates was investigated using solvents that were PS or PDMS selective, neutral and non-solvents based on their Hansen solubility parameters. The different morphologies were achieved with annealing times ranging from 10 min to 1 h at room temperature. The SD39 patterns were used as an etch mask for transferring the pattern into the underlying substrate. Directed self-assembly and hierarchical directed self-assembly on block copolymer templates for confinement of dots was successfully demonstrated. The strategy for achieving multiple morphologies using one BCP by mere choice of the annealing solvents on unmodified substrates provides a simplified method for surface nanopatterning, templated growth of nanomaterials and nanofabrication.",

keywords = "Block copolymer, Hansen solubility, Hierarchical self-assembly, Selective solvent",

author = "Sozaraj Rasappa and Lars Schulte and Dipu Borah and Hanna Hulkkonen and Sokol Ndoni and Turkka Salminen and Ramsankar Senthamaraikanan and Morris, \{Michael A.\} and Tapio Niemi",

year = "2018",

month = may,

day = "15",

doi = "10.1016/j.mee.2018.02.002",

language = "English",

volume = "192",

pages = "1--7",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}

TY - JOUR

T1 - Morphology evolution of PS-b-PDMS block copolymer and its hierarchical directed self-assembly on block copolymer templates

AU - Rasappa, Sozaraj

AU - Schulte, Lars

AU - Borah, Dipu

AU - Hulkkonen, Hanna

AU - Ndoni, Sokol

AU - Salminen, Turkka

AU - Senthamaraikanan, Ramsankar

AU - Morris, Michael A.

AU - Niemi, Tapio

PY - 2018/5/15

Y1 - 2018/5/15

N2 - Cylinder-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS, 27.2k-b-11.7k, SD39) block copolymer having a total molecular weight of 39 kg mol−1 was exploited to achieve in-plane morphologies of lines, dots and antidots. Brush-free self-assembly of the SD39 on silicon substrates was investigated using solvents that were PS or PDMS selective, neutral and non-solvents based on their Hansen solubility parameters. The different morphologies were achieved with annealing times ranging from 10 min to 1 h at room temperature. The SD39 patterns were used as an etch mask for transferring the pattern into the underlying substrate. Directed self-assembly and hierarchical directed self-assembly on block copolymer templates for confinement of dots was successfully demonstrated. The strategy for achieving multiple morphologies using one BCP by mere choice of the annealing solvents on unmodified substrates provides a simplified method for surface nanopatterning, templated growth of nanomaterials and nanofabrication.

AB - Cylinder-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS, 27.2k-b-11.7k, SD39) block copolymer having a total molecular weight of 39 kg mol−1 was exploited to achieve in-plane morphologies of lines, dots and antidots. Brush-free self-assembly of the SD39 on silicon substrates was investigated using solvents that were PS or PDMS selective, neutral and non-solvents based on their Hansen solubility parameters. The different morphologies were achieved with annealing times ranging from 10 min to 1 h at room temperature. The SD39 patterns were used as an etch mask for transferring the pattern into the underlying substrate. Directed self-assembly and hierarchical directed self-assembly on block copolymer templates for confinement of dots was successfully demonstrated. The strategy for achieving multiple morphologies using one BCP by mere choice of the annealing solvents on unmodified substrates provides a simplified method for surface nanopatterning, templated growth of nanomaterials and nanofabrication.

KW - Block copolymer

KW - Hansen solubility

KW - Hierarchical self-assembly

KW - Selective solvent

U2 - 10.1016/j.mee.2018.02.002

DO - 10.1016/j.mee.2018.02.002

M3 - Article

AN - SCOPUS:85041706803

SN - 0167-9317

VL - 192

SP - 1

EP - 7

JO - Microelectronic Engineering

JF - Microelectronic Engineering

ER -

Morphology evolution of PS-b-PDMS block copolymer and its hierarchical directed self-assembly on block copolymer templates

Abstrakti

Rahoitus

Julkaisufoorumi-taso

!!ASJC Scopus subject areas

Pääsy asiakirjaan

Sormenjälki

Siteeraa tätä