Keyphrases
Master Oscillator
100%
Narrow Linewidth
100%
Surface Grating
100%
Ultraviolet Nanoimprint Lithography (UV-NIL)
100%
Distributed Feedback
100%
Distributed Bragg Reector
100%
Power Output
80%
Grating
60%
Fabrication Methods
40%
Bias Current
40%
Device Design
40%
Full Width at Half Maximum
40%
Technological Constraints
40%
Emission Linewidth
40%
Wide Trench
40%
High Performance
20%
High Power
20%
Continuous Wave
20%
Radiation Loss
20%
Emission Spectrum
20%
Inuence
20%
Slope Efficiency
20%
Contamination Risk
20%
High-throughput
20%
Lower Order
20%
Mass Production
20%
Semiconductors
20%
Good Enough
20%
Design Parameters
20%
Pulse Width
20%
Thermal Management
20%
Regrowth
20%
Dene
20%
Laterally Coupled
20%
Soft Stamp
20%
Duty Cycle
20%
Grating Period
20%
Active Layer
20%
Aspect Ratio
20%
Fabrication Cost
20%
Pulse Mode
20%
Waveguide Grating
20%
Protrusion
20%
Distributed Feedback Laser
20%
Design Elements
20%
Maximum Output Power
20%
Device Performance
20%
Edge Emitting
20%
Ridge Waveguide
20%
Performance Reliability
20%
Etching Mask
20%
Epitaxial Regrowth
20%
High Injection
20%
Oxidization
20%
Nonradiative Recombination
20%
Device Reliability
20%
Pulse Mode Operation
20%
Waveguide Layer
20%
Injection Current
20%
Current Leakage
20%
Scattering Effect
20%
Defect-Prone
20%
Performance Yield
20%
Injected Carriers
20%
Conventional Photolithography
20%
Laser Characteristics
20%
Device Yield
20%
Lateral Current
20%
Diffraction Effect
20%
Linewidth Measurement
20%
Reduced Radiation
20%
Engineering
Nanoimprint Lithography
100%
Bragg Cell
100%
Oscillator
100%
Output Power
80%
Waveguide
40%
Linewidth Emission
40%
Limitations
20%
Continuous Wave
20%
Emission Wavelength
20%
Radiation Loss
20%
Design Element
20%
Fabrication Method
20%
Duty Cycle
20%
Optical Lithography
20%
Design Parameter
20%
Device Performance
20%
Current Injection
20%
Maximum Output Power
20%
Mode Operation
20%
Oxidization
20%
Grating Period
20%
Scattering Effect
20%
Radiative Recombination
20%
Central Ridge
20%
Diffraction Effect
20%
Mass Production
20%
Pulse Duration
20%
Aspect Ratio
20%