Optimizing Hafnium Oxide Thin-Film Dielectrics: Developing a Novel Atomic Layer Deposition Recipe

Material Science

• Thin Films 100%
• Oxide Compound 100%
• Dielectric Films 100%
• Hafnium 100%
• Dielectric Material 100%
• Film 66%
• Transistor 33%
• Electrical Property 33%
• Annealing 33%
• Metal Oxide 33%
• Semiconductor Structure 33%
• Oxide Semiconductor 33%
• Thin Film Deposition 33%
• Phase Composition 33%

Keyphrases

• High-k Material 50%
• Thermal Atomic Layer Deposition 50%
• Film Quality 50%
• Furnace Annealing 50%
• Fowler-Nordheim Tunneling 50%