Plasma-assisted chemical vapor deposition of Fe:TiO2 films for photoelectrochemical hydrogen production

A. Mettenbörger; V. Merod; A.P. Singh; H. Lemmetyinen; S. Mathur

Plasma-assisted chemical vapor deposition of Fe:TiO2 films for photoelectrochemical hydrogen production

Julkaisun otsikon käännös: Plasma-assisted chemical vapor deposition of Fe:TiO2 films for photoelectrochemical hydrogen production

A. Mettenbörger
, V. Merod
, A.P. Singh
, H. Lemmetyinen
, S. Mathur

Tutkimustuotos: Konferenssiartikkeli › Tieteellinen › vertaisarvioitu

Julkaisun otsikon käännös	Plasma-assisted chemical vapor deposition of Fe:TiO2 films for photoelectrochemical hydrogen production
Alkuperäiskieli	Englanti
Otsikko	Nanostructured Materials and Nanotechnology V - 36th International Conference on Advanced Ceramics and Composites, ICACC 2012, Daytona Beach, FL, USA, 22.-27.1.2013
Kustantaja	American Ceramic Society
Sivut	81-88
Sivumäärä	8
ISBN (painettu)	978-111820597-6
Tila	Julkaistu - 2013
OKM-julkaisutyyppi	A4 Artikkeli konferenssijulkaisussa
Tapahtuma	CERAMIC ENGINEERING AND SCIENCE PROCEEDINGS - Kesto: 1 tammik. 1900 → …

Julkaisusarja

Nimi	Ceramic Engineering and Science Proceedings
Numero	7
Vuosikerta	33
ISSN (painettu)	0196-6219
ISSN (elektroninen)	1940-6339

Conference

Conference	CERAMIC ENGINEERING AND SCIENCE PROCEEDINGS
Ajanjakso	1/01/00 → …

YK:n kestävän kehityksen tavoitteet

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SDG 7 – Edullinen ja puhdas energia

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Siteeraa tätä

Mettenbörger, A., Merod, V., Singh, A. P., Lemmetyinen, H., & Mathur, S. (2013). Plasma-assisted chemical vapor deposition of Fe:TiO2 films for photoelectrochemical hydrogen production. teoksessa Nanostructured Materials and Nanotechnology V - 36th International Conference on Advanced Ceramics and Composites, ICACC 2012, Daytona Beach, FL, USA, 22.-27.1.2013 (Sivut 81-88). (Ceramic Engineering and Science Proceedings; Vuosikerta 33, Nro 7). American Ceramic Society.

Mettenbörger, A. ; Merod, V. ; Singh, A.P. et al. / Plasma-assisted chemical vapor deposition of Fe:TiO2 films for photoelectrochemical hydrogen production. Nanostructured Materials and Nanotechnology V - 36th International Conference on Advanced Ceramics and Composites, ICACC 2012, Daytona Beach, FL, USA, 22.-27.1.2013. American Ceramic Society, 2013. Sivut 81-88 (Ceramic Engineering and Science Proceedings; 7).

@inproceedings{5905d998e1164642a4370d4990c99248,

title = "Plasma-assisted chemical vapor deposition of Fe:TiO2 films for photoelectrochemical hydrogen production",

author = "A. Mettenb{\"o}rger and V. Merod and A.P. Singh and H. Lemmetyinen and S. Mathur",

note = "Contribution: organisation=keb,FACT1=1<br/>Portfolio EDEND: 2013-12-29<br/>Publisher name: American Ceramic Society; CERAMIC ENGINEERING AND SCIENCE PROCEEDINGS ; Conference date: 01-01-1900",

year = "2013",

language = "English",

isbn = "978-111820597-6",

series = "Ceramic Engineering and Science Proceedings",

publisher = "American Ceramic Society",

number = "7",

pages = "81--88",

booktitle = "Nanostructured Materials and Nanotechnology V - 36th International Conference on Advanced Ceramics and Composites, ICACC 2012, Daytona Beach, FL, USA, 22.-27.1.2013",

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Mettenbörger, A, Merod, V, Singh, AP, Lemmetyinen, H & Mathur, S 2013, Plasma-assisted chemical vapor deposition of Fe:TiO2 films for photoelectrochemical hydrogen production. julkaisussa Nanostructured Materials and Nanotechnology V - 36th International Conference on Advanced Ceramics and Composites, ICACC 2012, Daytona Beach, FL, USA, 22.-27.1.2013. Ceramic Engineering and Science Proceedings, Nro 7, Vuosikerta 33, American Ceramic Society, Sivut 81-88, CERAMIC ENGINEERING AND SCIENCE PROCEEDINGS, 1/01/00.

Plasma-assisted chemical vapor deposition of Fe:TiO2 films for photoelectrochemical hydrogen production. / Mettenbörger, A.; Merod, V.; Singh, A.P. et al.
Nanostructured Materials and Nanotechnology V - 36th International Conference on Advanced Ceramics and Composites, ICACC 2012, Daytona Beach, FL, USA, 22.-27.1.2013. American Ceramic Society, 2013. s. 81-88 (Ceramic Engineering and Science Proceedings; Vuosikerta 33, Nro 7).

Tutkimustuotos: Konferenssiartikkeli › Tieteellinen › vertaisarvioitu

TY - GEN

T1 - Plasma-assisted chemical vapor deposition of Fe:TiO2 films for photoelectrochemical hydrogen production

AU - Mettenbörger, A.

AU - Merod, V.

AU - Singh, A.P.

AU - Lemmetyinen, H.

AU - Mathur, S.

N1 - Contribution: organisation=keb,FACT1=1<br/>Portfolio EDEND: 2013-12-29<br/>Publisher name: American Ceramic Society

PY - 2013

Y1 - 2013

M3 - Conference contribution

SN - 978-111820597-6

T3 - Ceramic Engineering and Science Proceedings

SP - 81

EP - 88

BT - Nanostructured Materials and Nanotechnology V - 36th International Conference on Advanced Ceramics and Composites, ICACC 2012, Daytona Beach, FL, USA, 22.-27.1.2013

PB - American Ceramic Society

T2 - CERAMIC ENGINEERING AND SCIENCE PROCEEDINGS

Y2 - 1 January 1900

ER -

Mettenbörger A, Merod V, Singh AP, Lemmetyinen H, Mathur S. Plasma-assisted chemical vapor deposition of Fe:TiO2 films for photoelectrochemical hydrogen production. julkaisussa Nanostructured Materials and Nanotechnology V - 36th International Conference on Advanced Ceramics and Composites, ICACC 2012, Daytona Beach, FL, USA, 22.-27.1.2013. American Ceramic Society. 2013. s. 81-88. (Ceramic Engineering and Science Proceedings; 7).