Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques

Julkaisun otsikon käännös: Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques

Tutkimustuotos: Konferenssiartikkeli › Tieteellinen › vertaisarvioitu

5 Sitaatiot (Scopus)

Julkaisun otsikon käännös	Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques
Alkuperäiskieli	Englanti
Otsikko	Proceedings of the 2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, 9-12 August 2009, Changchun, China
Sivut	1835-1840
Tila	Julkaistu - 2009
OKM-julkaisutyyppi	A4 Artikkeli konferenssijulkaisussa

Julkaisufoorumi-taso

Ji, Z., Zhang, J., Olaizola, S. M., Verevkin, Y. K., Peng, C., Tan, C., Berthou, T., Tisserand, S., & Wang, Z. (2009). Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques. teoksessa Proceedings of the 2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, 9-12 August 2009, Changchun, China (Sivut 1835-1840)

@inproceedings{a854d599b8494feeab3f8447bd7eb721,

title = "Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques",

author = "Z. Ji and J. Zhang and S.M. Olaizola and Y.K. Verevkin and C. Peng and C. Tan and T. Berthou and S. Tisserand and Z. Wang",

note = "Contribution: organisation=orc,FACT1=1",

year = "2009",

language = "English",

isbn = "978-1-4244-2693-5",

pages = "1835--1840",

booktitle = "Proceedings of the 2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, 9-12 August 2009, Changchun, China",

}

Ji, Z, Zhang, J, Olaizola, SM, Verevkin, YK, Peng, C, Tan, C, Berthou, T, Tisserand, S & Wang, Z 2009, Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques. julkaisussa Proceedings of the 2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, 9-12 August 2009, Changchun, China. Sivut 1835-1840.

Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques. / Ji, Z.; Zhang, J.; Olaizola, S.M. et al.
Proceedings of the 2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, 9-12 August 2009, Changchun, China. 2009. s. 1835-1840.

Tutkimustuotos: Konferenssiartikkeli › Tieteellinen › vertaisarvioitu

TY - GEN

T1 - Quality inspection of nanoscale patterns produced by laser interference lithography using image analysis techniques

AU - Ji, Z.

AU - Zhang, J.

AU - Olaizola, S.M.

AU - Verevkin, Y.K.

AU - Peng, C.

AU - Tan, C.

AU - Berthou, T.

AU - Tisserand, S.

AU - Wang, Z.

N1 - Contribution: organisation=orc,FACT1=1

PY - 2009

Y1 - 2009

M3 - Conference contribution

SN - 978-1-4244-2693-5

SP - 1835

EP - 1840

BT - Proceedings of the 2009 IEEE International Conference on Mechatronics and Automation, ICMA 2009, 9-12 August 2009, Changchun, China

ER -