Site-controlled InAs quantum dots by nanoimprint lithography and molecular beam epitaxy

Andreas Schramm, Teemu Valtteri Hakkarainen, Juha Tommila, Mircea Guina, Christian Strelow, Tobias Kipp

Tutkimustuotos: Konferenssiartikkeli › Tieteellinen

Alkuperäiskieli	Englanti
Otsikko	ICPS 2012 - 31st International Conference on the Physics of Semiconductors, July 29 - Aug 3, 2012, Zurich, Switzerland
Tila	Julkaistu - 2012
OKM-julkaisutyyppi	B3 Vertaisarvioimaton artikkeli konferenssijulkaisussa

Siteeraa tätä

@inproceedings{31bfe0096236448685d5acbe17978ccd,

title = "Site-controlled InAs quantum dots by nanoimprint lithography and molecular beam epitaxy",

author = "Andreas Schramm and Hakkarainen, {Teemu Valtteri} and Juha Tommila and Mircea Guina and Christian Strelow and Tobias Kipp",

note = "xposter",

year = "2012",

language = "English",

booktitle = "ICPS 2012 - 31st International Conference on the Physics of Semiconductors, July 29 - Aug 3, 2012, Zurich, Switzerland",

}

TY - GEN

T1 - Site-controlled InAs quantum dots by nanoimprint lithography and molecular beam epitaxy

AU - Schramm, Andreas

AU - Hakkarainen, Teemu Valtteri

AU - Tommila, Juha

AU - Guina, Mircea

AU - Strelow, Christian

AU - Kipp, Tobias

N1 - xposter

PY - 2012

Y1 - 2012

M3 - Conference contribution

BT - ICPS 2012 - 31st International Conference on the Physics of Semiconductors, July 29 - Aug 3, 2012, Zurich, Switzerland

ER -