@inproceedings{3f5b13d53231448c94bef369d62a68fe,
title = "The applicability of electrodeposited photoresist in producing ultra-fine lines using sputtered seeding layers",
author = "P. Jalonen and A. Tuominen",
note = "ISBN 0-7803-6654-9<br/>Contribution: organisation=pori ttp,FACT1=1",
year = "2000",
language = "English",
isbn = "0-7803-6654-9",
pages = "152--155",
editor = "J.K. Kim",
booktitle = "EMAP 2000, Proceedings of International Symposium on Electronic Materials and Packaging, November 30 - December 2, 2000, Clear Water Bay, Kowloon",
}