Titanium Nitride Microelectrodes Deposited by Ion Beam Assisted E-beam Evaporation

Tomi Ryynänen, Maria Toivanen, Susanna Narkilahti, Jukka Lekkala

    Tutkimustuotos: AbstraktiScientific

    Abstrakti

    An alternative method for fabricating titanium nitride (TiN) microelectrodes is presented. In order to decrease the impedance and noise levels of microelectrodes, one of the most common methods is to coat the electrodes with TiN. Usually that has required the use of a sputtering device, but we have demonstrated that also an e-beam coater can be used for TiN deposition, if equipped with an ion source. Our first 30 µm microelectrodes fabricated by ion beam assisted deposition (IBAD) have impedances around 75 kΩ, which is close to the impedances reported for sputter deposited TiN microelectrodes.
    AlkuperäiskieliEnglanti
    DOI - pysyväislinkit
    TilaJulkaistu - 24 kesäk. 2016
    TapahtumaMEA meeting 2016 -
    Kesto: 28 kesäk. 20161 heinäk. 2016
    http://www.nmi.de/meameeting/

    Conference

    ConferenceMEA meeting 2016
    Ajanjakso28/06/161/07/16
    www-osoite

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