Use of nanostructured alumina thin films in multilayer anti-reflective coatings

Tutkimustuotos: ArtikkeliScientificvertaisarvioitu

7 Lataukset (Pure)

Abstrakti

A new method for modification of planar multilayer structures to create nanostructured aluminum oxide anti-reflection coatings is reported. The method is non-toxic and low-cost, being based on treatment of the coating with heated de-ionized water after the deposition of aluminum oxide. The results show that the method provides a viable alternative for attaining a low reflectance ARC. In particular, a low average reflectivity of ∼3.3% is demonstrated in a broadband spectrum extending from 400 nm to 2000 nm for ARCs deposited on GaInP solar-cells, the typical material used as top-junction in solar cell tandem architectures. Moreover, the process is compatible with volume manufacturing technologies used in photovoltaics, such as ion beam sputtering and electron beam evaporation.

AlkuperäiskieliEnglanti
Artikkeli215602
Sivumäärä9
JulkaisuNanotechnology
Vuosikerta32
Numero21
DOI - pysyväislinkit
TilaJulkaistu - 2021
OKM-julkaisutyyppiA1 Alkuperäisartikkeli tieteellisessä aikakauslehdessä

Julkaisufoorumi-taso

  • Jufo-taso 2

!!ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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